Applied Materials

The technology challenges in making advanced semiconductor processes work with acceptable yield are immense.

These, together with additional design challenges and constraints, result in a huge and complex set of design rules. Developing such rules, capturing them clearly and ensuring their intent is correctly and accurately embodied in downstream PDKs is a major challenge. The iDRM platform enables easy and clear capture of design rules, managing them and ensuring their implementation accuracy.

iDRM Features and Benefits:

Graphical design rule entry provides ease of use and clarity
Design rules can be immediately verified on test data to ensure intent is captured correctly and accurately
Supports both equation-based and pattern-based rules
Easy data mining provides complete statistics on actual use of each pattern and design rule in any design
Enables quick impact analysis of a design rule change on existing design data

Contact us to learn how Sage Design Automation can help you accelerate design enablement for new process technologies.