Sage presents papers in SPIE Advanced Lithography Digital Forum
22-26 February 2021
Sage-DA will present its unique solutions for design enablement and rapid technology path-finding for Materials to System Co-Optimization™ (MSCO™) . We will also present two papers in the Design-Technology Co-Optimization XV conference, showing applications of Materials to Systems Co-Optimization in two different flows:
iDRM has already been adopted, delivering higher quality DRC decks and updates, at a much shorter time and a lower effort.
Applied Materials will present a case study of an automated Standard Cell Library generation for use in Materials to Systems Co-Optimization flow. The paper examines the impact of advanced materials, process and design rules on complex Standard Cells and explores innovative Standard Cell architectural choices at the N3 technology node. The flow uses SLiC for automatic generation of Standard Cells, enabling rapid iterations and analysis of multiple design and process options. The paper will be presented in Design-Technology Co-Optimization XV conference, Session 9, Paper 11614-36 by Maarten Berkens.
Applied Materials will present a framework that extends Materials to Systems Co-Optimization (MSCO) modeling to memory array simulations. This paper describes a methodology that builds models from materials and process, through devices, memory cells and to full memory arrays, and its application to an embedded SARM array in a N3 logic technology. The paper will be presented in:
Design-Technology Co-Optimization XV conference, Session 4, Paper 11614-14, by Ashish Pal.