By Daniel Nenni

While some might have expected the exponential growth in design rules number and complexity to cool down a little, it looks as if these are only heating up more. The multiplicity of technology nodes, lithography options, fundamental technology options (Bulk, FD-SOI, FinFET), different process flavors and specific applications, have made design enablement and design rules in particular an even more painful issue than it used to be.

Sage-DA addresses this problem in a systematic way with iDRM, a complete end-to-end ...

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